Screen: SOKUDO DUO sets productivity world record and >350wph throughput target

29. November 2010

Sokudo Co., Ltd. announced today that new world record productivity benchmarks have been established with their dual track, SOKUDO DUO system and throughput capability will be further increased beyond 350 wafers per hour (wph) in-line with photolithography exposure equipment.

By similar technology improvements a stand-alone SOKUDO DUO system will be able to exceed 450wph throughput. The key components to realize these extremely high productivity levels will be in place and demonstrated later next year 2011.

Early last year, May 2009 Sokudo announced demonstrating 300wph throughput with a stand-alone SOKUDO DUO system. However, to date in-line coat/develop track systems had only been targeted for up to 250wph when integrated with photolithography exposure systems, also known as scanners.