November 2010
Simultaneous Achievement of World’s Best Productivity and Clean Level.
Dainippon Screen Mfg. Co., Ltd., today announced that it has developed the SU-3200, a single wafer cleaning system* that delivers the world’s highest...[weiterlesen...]
Oktober 2010
Achieving Increased Yield in Next-generation Semiconductor Devices through Optimization of Cleaning Droplet Energy.
Dainippon Screen Mfg. Co., Ltd., announced today that it has successfully developed the NanosprayÅ (Nanospray...[weiterlesen...]
Juni 2010
Dainippon Screen Mfg. Co., Ltd. announced today that it has developed the CW-1500 compact wet station, a batch-type automatic cleaning system suited to the manufacturing of eco-friendly products known as “green devices.”*
Sales...[weiterlesen...]
Mai 2010
Dainippon Screen Mfg. Co., Ltd. secured the top share in the worldwide market for its semiconductor cleaning equipment in three key fields in 2009, holding fast to its position as an industry leader for three consecutive years...[weiterlesen...]
April 2010
Dainippon Screen Mfg. Co., Ltd. attained a 69%* share of the coater/developer segment of the global market for LCD manufacturing equipment in 2009.
This result has been established via an independent third-party survey**...[weiterlesen...]
Juli 2009
Sokudo Co., Ltd. (a joint venture company established between Dainippon Screen Mfg. Co., Ltd., and Applied Materials, Inc.) announced today that its revolutionary SOKUDO DUO coat/develop track platform has been running at a...[weiterlesen...]
November 2008
Dainippon Screen Mfg. Co., Ltd. has recently developed the world’s first drying technology for use in 300-mm wafer semiconductor device production lines that does not require IPA (isopropyl alcohol).
Sales of FC-3100 batch...[weiterlesen...]
